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Materials Science, Physics

New Materials for Sputtering Targets: A Promising Future

New Materials for Sputtering Targets: A Promising Future

In the field of materials science, researchers often study the properties of tiny structures called nanostructures using a powerful tool called atomic precision tomography (APT). However, preparing these tiny samples for analysis can be challenging. This review article discusses different approaches to prepare nanoparticles, nanosheets, and nanowires for APT characterization.
One common method involves coating the nanoparticles on pre-sharpened needles using electrothermal deposition or chemical vapor deposition (CVD). The needle shape allows these needles to be analyzed directly in an atom probe without any special preparation. However, this method can be time-consuming and may not work well for some materials.
Another approach is to use a micromanipulator to attach nanoparticles on pre-sharpened needles followed by FIB milling to sharpen the needle tips. This method allows for better control over the sample preparation process but can be limited by the size of the nanoparticles and the FIB resolution.
Recently, researchers have developed new methods to encapsulate the nanoparticles with a dense matrix material using atomic layer deposition (ALD) or metallic electrodeposition (MED). This approach enables the use of standard SEM-FIB techniques for nanostructure analysis without special sample preparation.
In conclusion, various methods have been developed to prepare nanostructures for APT characterization. These methods offer different advantages and limitations, and researchers can choose the most suitable approach depending on the material properties and their specific experimental requirements. By encapsulating nanoparticles with a dense matrix material, these methods make it possible to use standard specimen preparation techniques for nanostructure analysis, simplifying the study of these tiny structures.